Abstract by Grant Hodges
Chemistry and Biochemistry
NSL Polystyrene nano-sphere deposition
To develop an industrially viable method of producing nanohole arrays via nano-sphere lithography (NSL). We will address current deficiencies in the NSL process by chemically modifying the surface of the polystyrene nano-spheres so to facilitate monolayer formation and reduce fissure defects. This will be done by modifying the polystyrene nano-spheres with PVP and APTES. By using polyvinylpyrrolidone (PVP) as a linking moiety between the polystyrene nano-sphere and 3-aminopropyltriethoxysilane (APTES), this coating will tune the surface free energy of the spheres to promote monolayer formation. A successful coating will enable large area NSL masks with few fissure defects where sphere diameter can be tuned by reactive ion etching (RIE). This surface modification will be the first step towards developing an industrially viable NSL protocol for fabricating nanohole array devices. To properly assess the efficacy of the deposition outlined above, we performed visual inspection at the micron-nano scale with a scanning elctron microscope.